WELCOME TO JSPP-12 & APCPST-15
On behalf of the organizing committees of the 12th EU-Japan Joint Symposium on Plasma Processing (JSPP-12) and 15th Asia-Pacific Conference on Plasma Science and Technology (APCPST-15), I would like to invite you to participate in the joint virtual conference of JSPP-12/APCPST-15, which will be held online from the 29th March to 2nd April, 2021. To accommodate a large part of the globe, the conference will be open for about 2 hours a day from 07:00 to 09:00 GMT (9:00-11:00 CEST, 16:00-18:00 JST). The JSPP-12/APCPST-15 is an international symposium open to anyone from around the world (not limited to those from EU and Asia Pacific regions) who is interested in plasma science and technologies in general.
This time, the JSPP-12/APCPST-15 will be held jointly with the 3rd International Conference on Data-Driven Plasma Science (ICDDPS-3) on the same days but at different times. So the registered participants can attend both JSPP-12/APCPST-15 and ICDDPS-3 free of charge. We look forward to seeing you online soon.
Satoshi Hamaguchi,
Co-Chair, JSPP-12 & APCPST-15 |
IMPORTANT CHANGES OF JSPP-12 and APCPST-15
Due to the continuing travel restrictions, JSPP-12 and APCPST-15 will be held as an entirely virtual conference from 29 March (Mon) to 2April (Fri), 2021. To accommodate a large part of the globe, the conference will be open for 2 hours a day from 07:00 to 09:00 GMT (9:00-11:00 CEST, 16:00-18:00 JST). Accordingly the number of presentations will be limited and most of the scheduled invited talks will be postponed to future JSPP and APCPST. The final program of the JSPP-12 and APCPST-15 will be posted soon. The registration is free of charge and the web site for new registration is now open, so please register by the deadline 22 March, 2021. We apologize for any inconvenience that may be caused by these changes.
Satoshi Hamaguchi,
Co-Chair, Organizing Committee, JSPP-12
Co-Chair, Organizing Committee, APCPST-15 |
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The registration is free of charge: deadline 22 March, 2021
The abstract submission, including Post Deadline abstracts, is now closed.
- Atomic and molecular processes in plasmas
Collision cross sections
Fundamentals of low temperature plasmas
Plasma-surface interactions
Catalytic reactions with plasmas
Plasma diagnostics
Modeling and numerical simulations of plasmas and surfaces
Atmospheric/high-pressure plasmas
Plasmas in (contact with) liquids / plasma-liquid interaction
Plasma processing of materials, including etching and deposition
Plasma application for nanotechnologies
Plasma application for biology, medicine, and agriculture
Plasma application for environmental issues
Others
Special Session:plasma simulation
Special Session:advanced semiconductor processes
- The official language of the symposium is English.
- Submit from here.
- Deadline: 11 December, 2020 (new)
Notice of Acceptance: mid January, 2021 (new)
- (a)Timetable Updated Mar. 4, 2021
- Program-Presentation
Titles Updated Mar. 10, 2021
- (b) Invited Speakers
- Masanaga Fukasawa (Sony Semiconductor Solutions Corp., Japan)
Romolo Laurita (University of Bologna, Italy)
Paul Moroz (Tokyo Electron America, Inc., USA)
Deborah O'Connell (Dublin City University, Ireland)
Yuan-Hong Song (Dalian University of Technology, China)
Lenka Zajickova (Masaryk University, Czech Republic)
- Satoshi Hamaguchi (Co-Chair, Osaka University, Japan)
Nigel Mason (Co-Chiar, University of Kent, UK)
Zoran Lj. Petrović (Serbian Academy of Sciences and Arts, Serbia)
Katsuhisa Kitano (Secretary, Osaka University, Japan)
Uroš Cvelbar (Jožef Stefan Institute., Slovenia)
Uwe Czarnetzki (Ruhr University Bochum, Germany)
Štefan Matejčík (Comenius University, Slovakia)
Masaharu Shiratani (Kyushu University, Japan)
Peter L. G. Ventzek (Tokyo Electron America, USA)
- Satoshi Hamaguchi (Co-Chair, Osaka University, Japan)
Takayuki Watanabe (Co-Chair, Kyushu University, Japan)
Roderick W. (Rod) Boswell (Australian National University, Australia)
Hong Young Chang (KAIST, Korea)
Chi Kyu Choi (Jeju National University, Korea)
Tony Murphy (CSIRO, Australia)
Yuan-Hong Song (Dalian University of Technology, China)
You-Nian Wang (Dalian University of Technology, China)
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