"Monitoring of non-thermal plasma degradation of phthalates by ion mobility spectrometry," Ladislav Moravský, Bartosz Michalczuk, Jana Hrdá, Satoshi Hamaguchi, and Štefan Matejčík, Plasma Process Polym.18(7) (2021) 2100032 (11pp.).
"Susceptibility of Staphylococcus epidermidis to argon cold plasma jet by oxygen admixture," Abdel-Aleam H. Mohamed, Abdulrahman H. Basher, Jamal Q. M. Almarashi, and Salama A. Ouf, Appl. Sci.11(8) (2021) 3455.
"Surface damage formation during atomic layer etching of silicon with chlorine adsorption," Erin Joy Capdos Tinacba, Michiro Isobe, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A39 (2021) 042603 (11pp.).
"Evaluation of nickel self-sputtering yields by molecular-dynamics simulation," Nicolas A. Mauchamp, Michiro Isobe, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A39 (2021) 043005 (11pp.).
"Identification of fragment ions produced by the decomposition of tetramethyltin and the production of low-energy Sn+ ion beam," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, PLOS ONE16(6) (2021) e0253870 (12pp.).
"Molecular dynamics simulation for reactive ion etching of Si and SiO2 by SF5+ ions," Erin Joy Capdos Tinacba, Tomoko Ito, Kazuhiro Karahashi, Michiro Isobe, and Satoshi Hamaguchi, J. Vac. Sci. Technol. B39 (2021) 043203 (11pp.).
"Amine modification of calcium phosphates by low-pressure plasma for bone regeneration," Joe Kodama, Anjar Anggraini Harumningtyas, Tomoko Ito, Miroslav Michlíček, Satoshi Sugimoto, Yuichiro Ukon, Junichi Kushioka, Rintaro Okada, Takashi Kamatani, Kunihiko Hashimoto, Daisuke Tateiwa, Hiroyuki Tsukazaki, Shinichi Nakagawa, Shota Takenaka, Takahiro Makino, Yusuke Sakai, David Nečas, Lenka Zajíčková, Satoshi Hamaguchi, Takashi Kaito, Scientific Reports11 (2021) 17870.
'Erratum: "Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes" [J. Vac. Sci. Technol. A38 (2020), 052602]' Abdulrahman H. Basher, Marjan Krstić, Karin Fink, Tomoko Ito, Kazuhiro Karahashi, Wolfgang Wenzel, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A39 (2021) 057001.
"Low-energy Ar+ and N+ ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, PLOS ONE16(10) (2021) e0259216 (11pp.).
"Development of a DC-Plasma Source for Surface Functionalization by Amino Groups," Anjar Anggraini Harumningtyas, Suprapto, Hari Suprihatin, Ihwanul Aziz, Wiwien Andriyanti, Tjipto Sujitno, Agus Purwadi, and Satoshi Hamaguchi, AIP Conference Proceedings2381 (2021) 020018.
"Low-energy O+ ion beam induced chemical vapor deposition using hexamethyldisilane or hexamethyldisilazane for silicon dioxide film formation," S. Yoshimura, S. Sugimoto, T. Takeuchi, and M. Kiuchi, AIP Advances11(12) (2021) 125328 (6pp.).
"Preface to Special Topic: Invited Papers from the 2nd International Conference on Data-Driven Plasma Science," Sadruddin Benkadda, Satoshi Hamaguchi, Magali Muraglia, and Deborah O’Connell, Phys. Plasmas28(3) (2021) 030401 (2pp.).
"Characterization of descriptors in machine learning for data-based sputtering yield prediction," Hiori Kino, Kazumasa Ikuse, Hieu-Chi Dam, and Satoshi Hamaguchi, Phys. Plasmas28(1) (2021) 013504 (13pp.).
"Production of low-energy fragment-ion beams from hexamethyldisiloxane and the irradiation of SiO+ ion beam to substrates with supplemental oxygen gas for SiO2 film formation," S. Yoshimura, S. Sugimoto, T. Takeuchi, and M. Kiuchi, Nucl. Instrum. Methods. Phys. Res. B487 (2021) pp.85-89.
"Development of a Massively Parallelized Fluid-Based Plasma Simulation Code with a Finite-Volume Method on an Unstructured Grid," Kuan-Lin Chen, Meng-Fan Tseng, Ming-Chung Lo, Satoshi Hamaguchi, Meng-Hua Hu, Yun-Ming Lee, and Jong-Shinn Wu, IEEE Trans. Plasma Sci.49(1) (2021) pp.104-119.
▼ Year 2020
"Mechanism of SiN etching rate fluctuation in atomic layer etching," Akiko Hirata, Masanaga Fukasawa, Katsuhisa Kugimiya, Kojiro Nagaoka, Kazuhiro Karahashi, Satoshi Hamaguchi, and Hayato Iwamoto, J. Vac. Soc. Technol. A38(06) (2020) 062601 (9pp.).
"Production of low-energy SiCH3+ and SiC2H7+ ion beams for 3C-SiC film formation by selecting fragment ions from dimethylsilane," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, Nucl. Instrum. Methods. Phys. Res. B479 (2020) pp.13-17.
"Molecular dynamics simulation of amine groups formation during plasma processing of polystyrene surfaces," Miroslav Michlíček, Satoshi Hamaguchi, and Lenka Zajíčková, Plasma Sources Sci. Technol.29(5) (2020) 105020 (13pp.).
"Modeling characterisation of a bipolar pulsed discharge," Zoltán Donko, Lenka Zajíčková, Satoshi Sugimoto, Anjar Anggraini Harumningtyas, Satoshi Hamaguchi, Plasma Sources Sci. Technol.29(10) (2020) 104001 (13pp.).
"Suppression of Cooking Oil Deterioration by Electromagnetic Field with Harmonics Generated by Asymmetric Circuit," Masato Kiuchi and Tatsuji Miyagawa, Plasma Medicine, 10(2), (2020) pp.103-111.
"Self-limiting processes in thermal atomic layer etching of nickel by hexafluoroacetylacetone," Abdulrahman H. Basher, Ikutaro Hamada, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.59(09) (2020) 090905 (3pp.).
"Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes," Abdulrahman H. Basher, Marjan Krstić, Karin Fink, Tomoko Ito, Kazuhiro Karahashi, Wolfgang Wenzel, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A38(05) (2020) 052602 (11pp.).
"Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes," Hu Li, Tomoko Ito , Kazuhiro Karahashi, Munehito Kagaya, Tsuyoshi Moriya, Masaaki Matsukuma, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.59 (2020) SJJA01 (9pp.).
"On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes," A. Hirata, M. Fukasawa, K. Kugimiya, K. Nagaoka, K. Karahashi, S. Hamaguchi, and H. Iwamoto, Jpn. J. Appl. Phys. (2020) 59 SJJC01 (5pp.).
▼ Year 2019
"Dry Process FOREWORD," K. Kurihara, K. Karahashi, K. Kinoshita, M. Sekine, T. Ichikawa, T. Ishijima, and T. Shirafuji, Jpn. J. Appl. Phys.58 (2019) Se0001 (p.1).
"Molecular dynamics simulation of Si and SiO2 reactive ion etching by fluorine-rich ion species," Erin Joy Capdos Tinacba, Michiro Isobe, Kazuhiro Karahashi, and Satoshi Hamaguchi, Surface & Coatings Technology380 (2019) 125032 (8pp.).
"Plasmas for microfabrication," Satoshi Hamaguchi, Sumit Agarwal, Lenka Zajíčková, and Michael R Wertheimer, Plasma Processes and Polymers16 (9) (2019) 1990001 (2pp.).
"Damage recovery and low-damage etching of ITO in H2/CO plasma: Effects of hydrogen or oxygen," Akiko Hirata, Masanaga Fukasawa, Katsuhisa Kugimiya, Kazuhiro Karahashi, Satoshi Hamaguchi, and Kojiro Nagaoka, Plasma Process Polym.16 (2019) 1900029 (7pp.).
"Molybdenum Capping Layer Effect on Electromigration Failure of Plasma Etched Copper Lines," Jia Quan Su, Mingqian Li, Yue Kuo, and Satoshi Hamaguchi, ECS Trans.92(5) (2019) pp.39-46.
"Effects of excitation voltage pulse shape on the characteristics of atmospheric-pressure nanosecond discharges," Zoltan Donko, Satoshi Hamaguchi, and Timo Gans, Plasma Sources Sci. Technol.28 (2019) 075004 (14pp.).
"Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond," S. Yoshimura, S. Sugimoto, T. Takeuchi, and M. Kiuchi, AIP Advances9 (2019) 025008.
"Effects of injected ion energy on silicon carbide film formation by low-energy SiCH3+ beam irradiation," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, Thin Solid Films685 (2019) pp.408-413.
"Low-energy mass-selected ion beam deposition of silicon carbide with Bernas-type ion source using methylsilane," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, AIP Advances9 (2019) 095051.
"Characteristics of films deposited by the irradiation of GeCHx+ ions produced from hexamethyldigermane and their dependence on the injected ion energy," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, Nuclear Instruments and Methods in Physics Research B461 (2019) pp.1-5.
▼ Year 2018
"The future for plasma science and technology," Klaus-Dieter Weltmann, Juergen F. Kolb, Marcin Holub, Dirk Uhrlandt, Milan Šimek, Kostya (Ken) Ostrikov, Satoshi Hamaguchi, Uroš Cvelbar, Mirko Černák, Bruce Locke, Alexander Fridman, Pietro Favia, Kurt Becker, Plasma Process Polym.16 (2018) 1800118 (29pp.).
"Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms," Zoltán Donkó, Aranka Derzsi, Máté Vass, Julian Schulze, Edmund Schuengel, and Satoshi Hamaguchi, Plasma Sources Sci. Technol.27 (2018) 104008 (20pp.).
"The effect of photoemission on nanosecond helium microdischarges at atmospheric pressure," Zoltan Donko, Satoshi Hamaguchi, Timo Gans, Plasma Sources Sci. Technol.27 (2018) 054001 (14pp.).
"Cyclic etching of ITO using H-induced modified-layer," Akiko Hirata, Masanaga Fukasawa, Kazunori Nagahata, Hu Li, Kazuhiro Karahashi, Satoshi Hamaguchi, and Tetsuya Tatsumi, Jpn. J. Appl. Phys.57 (2018) 06JB02 (5pp.).
"Effects of Hydrogen on the Chemically Enhanced Etching of Tin-doped Indium Oxide (ITO)," Hu Li, Kazuhiro Karahashi, Pascal Friederich, Karin Fink, Masanaga Fukasawa, Akiko Hirata, Kazunori Nagahata, Tetsuya Tatsumi, Wolfgang Wenzel, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.57 (2018) 06JC05 (8pp.).
"Impact of non-thermal plasma surface modification on porous calcium hydroxyapatite ceramics for bone regeneration," Yu Moriguchi, Dae-Sung Lee, Ryota Chijimatsu, Khair Thamina, Kazuto Masuda, Dai Itsuki, Hideki Yoshikawa, Satoshi Hamaguchi, Akira Myoui, PLOS ONE13 (2018) e0194303 (18pp.).
"Progress in nanoscale dry processes of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?" Kenji Ishikawa, Kazuhiro Karahashi, Tatsuo Ishijima, Sung Il Cho, Simon Elliott, Dennis Hausmann, Dan Mocuta, Aaron Wilson, and Keizo Kinoshita, Jpn. J. Appl. Phys.57 (2018) 06JA01 (18pp.).
"Injected ion energy dependence of SiC film deposited by low-energy SiC3H9+ ion beam produced from hexamethyldisilane," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, Nuclear Instruments and Methods in Physics Research B420 (2018) pp.6-11.
"Low-energy mass-selected ion beam production of fragments from tetraethylorthosilicate for the formation of silicon dioxide film," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, Thin Solid Films655 (2018) pp.22-26.
"Deposition of indium nanoparticles on powdered material by pulse arc plasma to synthesize catalysts for Friedel-Crafts alkylation," S. Yoshimura, Y. Nishimoto, S. Sugimoto, M. Kiuchi, and M. Yasuda, e-Journal of Surface Science and Nanotechnology16 (2018) pp.105-110.
"Identification of fragment ions produced from hexamethyldisilazane and production of low-energy mass-selected fragment ion beam," S. Yoshimura, S. Sugimoto, T. Takeuchi, K. Murai, and M. Kiuchi, Nuclear Instruments and Methods in Physics Research B430 (2018) pp.1-5.
"Foundations of low-temperature plasma enhanced materials synthesis and etching," Gottlieb S. Oehrlein and Satoshi Hamaguchi, Plasma Sources Sci. Technol.27 (2018) 023001 (21pp.).
▼ Year 2017
"The 2017 Plasma Roadmap: Low temperature plasma science and technology," I Adamovich, S D Baalrud, A Bogaerts, P J Bruggeman, M Cappelli, V Colombo, U Czarnetzki, U Ebert, J G Eden, P Favia, D B Graves, S Hamaguchi, G Hieftje, M Hori, I D Kaganovich, U Kortshagen, M J Kushner, N J Mason, S Mazouffre, S Mededovic Thagard, H-R Metelmann, A Mizuno, E Moreau, A B Murphy, B A Niemira, G S Oehrlein, Z Lj Petrovic, L C Pitchford, Y-K Pu, S Rauf, O Sakai, S Samukawa, S Starikovskaia, J Tennyson, K Terashima, M M Turner, M C M van de Sanden, and A Vardelle, J. Phys. D: Appl. Phys.50 (2017) 323001 (46pp.).
"Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H2/Ar plasma," Akiko Hirata, Masanaga Fukasawa, Takushi Shigetoshi, Masaki Okamoto, Kazunori Nagahata, Hu Li, Kazuhiro Karahashi, Satoshi Hamaguchi, and Tetsuya Tatsumi, Jps. J. Appl. Phys.56 (2017) 06HD02 (4pp.).
"Effects of Hydrogen Ion Irradiation on Zinc Oxide Etch," Hu Li, Kazuhiro Karahashi, Pascal Friederich, Karin Fink, Masanaga Fukasawa, Akiko Hirata, Kazunori Nagahata, Tetsuya Tatsumi, Wolfgang Wenzel, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A35 (2017) 05C303 (9pp.).
"Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation," Kazuhiro Karahashi, Hu Li, Kentaro Yamada, Tomoko Ito, Satoshi Numazawa, Ken Machida, Kiyoshi Ishikawa, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.56 (2017) 06HB09 (5pp.).
"Progress and prospects in nanoscale dry processes - How can we control atomic layer reactions," Kenji Ishikawa, Kazuhiro Karahashi, Takanori Ichiki, Jane P. Chang, Steven M. George, W. M. M. Kessels, Hae June Lee, Stefen Tinck, Jung Hwan Um, and Keizo Kinoshita, Jpn. J. Appl. Phys.56 (2017) 06HA02 (13pp.).
"Low-energy mass-selected ion beam production of fragments produced from hexamethyldisiloxane for the formation of silicon oxide film," S. Yoshimura, S. Sugimoto, K. Murai, and M. Kiuchi, Surf. Coat. Technol.313 (2017) pp.402-406.
"Editorial for achieving atomistic control in plasma?material interactions," Gottlieb S Oehrlein, Satoshi Hamaguchi, and Achim Von Keudell, J. Phys. D: Appl. Phys.50 (2017) 490201 (4pp.).
"Catalytic property of an indium-deposited powder-type material containing silicon and its dependence on the dose of indium nano-particles irradiated by a pulse arc plasma process," S. Yoshimura, Y. Nishimoto, M. Kiuchi, Y. Agawa, H. Tanaka, and M. Yasuda, AIP Adv.7 (2017) 065117 (9pp.).
▼ Year 2016
"Plasma-Liquid Interactions: A Review and Roadmap," P.J. Bruggeman, M.J. Kushner, B.R. Locke, J.G.E. Gardeniers, W.G. Graham, D.B. Graves, R.C. Hofman-Caris, D. Maric, J.P. Reid, E. Ceriani, D. Fernandez Rivas, J. E. Foster, S.C. Garrick, Y. Gorbanev, S. Hamaguchi, F. Iza, J. Kolb, F. Krcma, P. Lukes, Z. Machala, I. Marinov, D. Mariotti, S. Mededovic Thagard, D. Minakata, E. Neyts, J. Pawlat, Z.Lj. Petrovic, R. Pfieger, S. Reuter, D.C. Schram, S. Schroter, M. Shiraiwa, B. Tarabová, H. Tresp, P. Tsai, J. Verlet, T. von Woedtke, E. Vyhnankova, K.R. Wilson, K. Yasui, and G. Zvereva, Plasma Sources Sci. Technol.25 (2016) 053002 (59pp.).
"Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes," Satoshi Numazawa, Ken Machida, Michiro Isobe, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.55 (2016) 116204 (6pp.).
"Low-energy SiC2H6+ and SiC3H9+ ion beam productions by the mass-selection of fragments produced form hexamethyldisilane for SiC film formations," S. Yoshimura, S. Sugimoto, K. Murai, and M. Kiuchi, AIP Advances6 (2016) 125029 (6pp.).
"Low-energy mass-selected ion beam production of fragments produced from hexamethyldisilane for SiC film formation," S. Yoshimura, S. Sugimoto, and M. Kiuchi, J. Appl. Phys.119(10) (2016) 103302 (4pp.).
"Atmospheric-pressure plasma-irradiation inhibits mouse embryonic stem cell differentiation to mesoderm and endoderm but promotes ectoderm differentiation," Taichi Miura, Satoshi Hamaguchi, and Shoko Nishihara, J. Phys. D: Appl. Phys.49 (2016) 165401 (12pp.).
"Mass-selected ion beam study on etching characteristics of ZnO by methane-based plasma," Hu Li, Kazuhiro Karahashi, Masanaga Fukasawa, Kazunori Nagahata, Tetsuya Tatsumi, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.55(2) (2016) 021202 (6pp.).
▼ Year 2015
"Mass spectrometry analyses of ions generated by atmospheric-pressure plasma jets in ambient air," Tomoko Ito, Kensaku Gotou, Kanako Sekimoto, and Satoshi Hamaguchi, Plasma Medicine5(2-4) (2015) pp.283-298.
"In Focus: Plasma Medicine," David Graves, Satoshi Hamaguchi, and Deborah O'Connell, Biointerphases10 (2015) 029301.
"Fragment ions produced from hexamethyldisilane in a Freeman-type ion source," S. Yoshimura and M. Kiuchi, Jpn. J. Appl. Phys.54(10) (2015) 108001 (3pp.).
"Indium implantation onto zeolite by pulse arc plasma process for the development of novel catalysts," S. Yoshimura, Y. Nishimoto, M. Kiuchi, and M. Yasuda, Chem. Lett.44(10) (2015) pp.1292-1294.
"Application of ion beam induced chemical vapor deposition for SiC film formation on Si substrates using methylsilane," S. Yoshimura, S. Sugimoto, K. Murai, K. Honjo, and M. Kiuchi, e-J. Surf. Sci. Nanotech.13 (2015) pp.174-178.
"Correlation between dry Etching Resistance of Ta masks and the oxidation states of the surface oxide layers," Makoto Satake, Masaki Yamada, Hu Li, Kazuhiro Karahashi, and Satoshi Hamaguchi, J. Vac. Sci. Technol. B33(5) (2015) 051810 (9pp.).
"Sputtering yield and surface chemical modification of tin-doped indium oxide (ITO) in hydrocarbon-based plasma etching," Hu Li, Kazuhiro Karahashi, Masanaga Fukusawa, Kazunori Nagahata, Tetsuya Tatsumi, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A33(6) (2015) 060606 (5pp.).
"Numerical simulation of atomic-layer oxidation of silicon by oxygen gas cluster beams," Kohei Mizotani, Michiro Isobe, Kazuhiro Karahashi, and Satoshi Hamaguchi, Plasma and Fusion Research10(14) (2015) 1406079 (5pp.).
"Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas," Hu Li, Yu Muraki, Kazuhiro Karahashi, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A33(04) (2015) 040602 (5pp.).
"Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation," Kohei Mizotani, Michiro Isobe, Masanaga Fukasawa, Kazunori Nagahata, Tetsuya Tatsumi, and Satoshi Hamaguchi, J. Phys. D: Appl. Phys.48(15) (2015) 152002 (5pp.).
"Molecular dynamic simulation of damage formation at Si vertical walls by grazing incidence of energetic ions in gate etching processes," Kohei Mizotani, Michiro Isobe, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A33(02) (2015) 021313 (6pp.).
▼ Year 2014
"Proliferation assay of mouse embryonic stem (ES) cells exposed to atmospheric pressure plasmas at room temperature," Taichi Miura, Ayumi Ando, Kazumi Hirano, Chika Ogura, Tatsuya Kanazawa, Masamichi Ikeguchi, Atsushi Seki, Shoko Nishihara, and Satoshi Hamaguchi, J. Phys. D: Appl. Phys.47(44) (2014) 445402 (12pp.).
"Low energy indium or gallium ion implantations to SiO2 thin films for development of novel catalysts," S. Yoshimura, M. Kiuchi, Y. Nishimoto, M. Yasuda, A. Baba, and S. Hamaguchi, e-J. Surf. Sci. Nanotech.12 (2014) pp.197-202.
"Computed multiple tomography for translated field reversed configuration plasma," S. Yoshimura, S. Sugimoto, and S. Okada, IEEE Trans. Plasma Sci.42 (2014) pp.2510-2511.
"Ion beam experiments for the study on plasma-surface interactions," Kazuhiro Karahashi and Satoshi Hamaguchi, J. Phys. D: Appl. Phys.47 (2014) 224008 (15pp.).
"Characterization of polymer layer formation during SiO2/SiN etching by fluoro/hydrofluorocarbon plasmas," Keita Miyake, Tomoko Ito, Michiro Isobe, Kazuhiro Karahashi, Masanaga Fukasawa, Kazunori Nagahata, Tetsuya Tatsumi, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.53 (2014) 03DD02.
▼ Year 2013
"Dependence of catalytic properties of indium implanted SiO2 thin films on the film-substrate temperature during indium ion implantation," S. Yoshimura, K. Ikuse, K. Kiuchi, Y. Kishimoto, M. Yasuda, A. Baba, and S. Hamaguchi, Nucl. Instrum. Meth. B315 (2013) pp.222-226.
"Oxidation of Nitric Oxide by Atmospheric Pressure Plasma in a Resonant Plasma Reactor," Takayoshi Yumii, Takashi Yoshida，Kyoji Doi，Noriaki Kimura, and Satoshi Hamaguchi, J. Phys. D: Appl. Phys.46(13) (2013) 135202 (7pp.).
"Characteristics of silicon etching by silicon chloride ions," Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kang, and Satoshi Hamaguchi, J. Vac. Sci. Technol. A31(3) (2013) 031301 (5pp.).
"Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication," Ayumi Ando, Hidetaka Uno, Tsuneo Uris, and Satoshi Hamaguchi, Appl. Surf. Sci.276(1) (2013) pp.1-6.
"Surface Modification of Poly(methyl methacrylate) by Hydrogen-Plasma Exposure and Its Sputtering Characteristics by Ultraviolet Light Irradiation," Satoru Yoshimura, Kazumasa Ikuse, Satoshi Sugimoto, Kensuke Murai, Kuniaki Honjo, Masato Kiuchi, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.52(9) (2013) 090201 (4pp.).
"Quantum Cascade Laser (QCL) Absorption Spectroscopy with the Amplitude-to-Time Conversion (ATTC) Technique for Atmospheric-Pressure Plasmas," Takayoshi Yumii, Noriaki Kimura, and Satoshi Hamaguchi, J. Appl. Phys.113(21) (2013) 213101 (10pp.).
▼ Year 2012
"Sputtering yields and surface modification of poly(methyl methacrylate) (PMMA) by low-energy Ar+/CF3+ ion bombardment with vacuum ultraviolet (VUV) photon irradiation," S. Yoshimura, Y. Tsukazaki, M. Kiuchi, S. Sugimoto, and S. Hamaguchi, J. Phys. D: Appl. Phys.45(50) (2012) 505201 (10pp.).
"Sputtering yields of magnesium hydroxide [Mg(OH)2] by noble-gas ion bombardment," Kazumasa Ikuse, Satoru Yoshimura, Masato Kiuchi, Masaharu Terauchi, Mikihiko Nishitani, and Satoshi Hamaguchi, J. Phys. D: Appl. Phys.45(43) (2012) 432001 (5pp.).
"Efficient modification of the surface properties of interconnected porous hydroxyapatite by low-pressure low-frequency plasma treatment to promote its biological performance," Dae-Sung Lee, Yu Moriguchi, Akira Myoui, Hideki Yoshikawa, and Satoshi Hamaguchi, J. Phys. D: Appl. Phys.45(37) (2012) 372001 (5pp.).
"Microcavity array plasma system for remote chemical processing at atmospheric pressure," Dae-Sung Lee, Satoshi Hamaguchi, Osamu Sakai, Sung-Jin Park, and J Gary Eden, J. Phys. D: Appl. Phys.45(22) (2012) 222001 (5pp.).
"Si damage due to oblique-angle ion impact relevant for vertical gate etching processes," Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kang, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.51(8) (2012) 08HB01 (4pp.).
"Dependence of catalytic properties of Indium-implanted SiO2 thin films on the energy and dose of incident Indium ions," S. Yoshimura, M. Kiuchi, Y. Nishimoto, M. Yasuda, A. Baba, and S. Hamaguchi, Thin Solid Films520(15) (2012) pp.4894-4897.
"Sputtering yields of CaO, SrO, and BaO by monochromatic noble gas ion bombardment," S. Yoshimura, K. Hine, M. Kiuchi, J. Hashimoto, M. Terauchi, Y. Honda, M.Nishitani, and S. Hamaguchi, Jpn. J. Appl. Phys.51(8) (2012) 08HB02 (4pp.).
"Low energy metal ion beam production with a modified Freeman-type ion source for development of novel catalysts," S. Yoshimura, M. Kiuchi, Y. Nishimoto, M. Yasuda, A. Baba, and S. Hamaguchi, e-J. Surf. Sci. Nanotech.10(4) (2012) pp.139-144.
"Extracellular Matrix Patterning for Cell Alignment by Atmospheric Pressure Plasma Jets," Ayumi Ando, Toshifumi Asano, Md. Abu Sayed, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu, and Satoshi Hamaguchi, Jpn. J. Appl. Phys.51(3) (2012) 036201 (7pp.).
▼ Year 2011
"Numerical analyses of hydrogen plasma generation by nanosecond pulsed high voltage at near-atmospheric pressure," C.-W. Lo and S. Hamaguchi, J. Phys. D: Appl. Phys.44 375201 (11pp) (2011).
"Electron density measurement of inductively coupled plasmas by terahertz time-domain spectroscopy (THz-TDS)," A. Ando, T. Kurose, V. Reymond, K. Kitano, H. Kitahara, K. Takano, M. Tani, M Hangyo, and S. Hamaguchi, J. Appl. Phys.110(7) 073303 (8pp) (2011).
"Rapid Breakdown Mechanisms of Open Air Nanosecond Dielectric Barrier Discharges," T. Ito, T. Kanazawa, and S. Hamaguchi, Phys. Rev. Lett.107(6), 065002 (4pp) (2011).
"Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF1+, CF2+, CHF2+, and CH2F+ ions," T. Ito, K. Karahashi, M. Fukasawa, T. Tatsumi, and S. Hamaguchi, J. Vac. Sci. Tech. A29, 050601 (4pp) (2011).
"Plasma Microchannel and Jet Enhanced by an Array of Ellipsoidal Microcavities," D.-S. Lee, O. Sakai, S.-J. Park, J.G. Eden, and S. Hamaguchi, IEEE Trans. Plasma Sci.39(11) 2690-2691 (2011).
"Improvement of Hydrophilicity of Interconnected Porous Hydroxyapatite by Dielectric Barrier Discharge Plasma Treatment," Dae-Sung Lee, Yu Moriguchi, Kiyoshi Okada, Akira Myoui, Hideki Yoshikawa, and Satoshi Hamaguchi, IEEE Trans. Plasma Sci.39(11) 2166-2167 (2011).
"Dynamics of Near-Atmospheric Pressure Hydrogen Plasmas Driven by Pulsed High Voltages," Chieh-Wen Lo and Satoshi Hamaguchi, IEEE Trans. Plasma Sci.39(11) 2100-2101 (2011).
"Experimental evaluation of CaO, SrO, and BaO sputtering yields by Ne or Xe ions," S. Yoshimura, K. Hine, M. Kiuchi, J. Hashimoto, M. Terauchi, Y. Honda, M. Nishitani, and S. Hamaguchi, J. Phys. D: Appl. Phys.44(25) 255203 (5pp) (2011).
"Si recess of Poly-Si Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion," T. Ito, K. Karahashi, M. Fukasawa, T. Tatsumi, and S. Hamaguchi, Jpn. J. Appl. Phys.50 08KD02 (5pp) (2011).
"Soft x-ray computer tomography of tokamak plasma in control experiment of locked mode disruption by electron cyclotron heating," S. Yoshimura and T. Maekawa, IEEE Trans. Plasma Sci.39(11) 3000-3001 (2011).
"Micro pattern formation of extracellular-matrix (ECM) layers by atmospheric-pressure plasmas and cell culture on the patterned ECMs," Ayumi Ando, Toshifumi Asano, Tsuneo Urisu, and Satoshi Hamaguchi, J. Phys. D: Appl. Phys.44 482002 (5pp) (2011).
"Arrangement of PC12 cells on a silicon chip via extracellular matrix (ECM) layer patterning by atmospheric pressure plasmas," Ayumi Ando, Hidetaka Uno, Toshifumi Asano, Tsuneo Urisu, and Satoshi Hamaguchi, Plasma Fusion Res.6 1306155 (4pp) (2011).
▼ Year 2010
"Facile Creation of Biointerface on Commodity Plastic Surface by Combination of Atmospheric Plasma and Reactive Polymer Coating," N. Kanayama, S. Kumar Saha, N. Nakayama, J. Nakanishi, K. Kitano, S. Hamaguchi, and Y. Nagasaki, J. Photopolymer Sci. Tech.23(4) (2010) pp.579-583.
"Reverse Propagation of Atmospheric Pressure Plasma Jets," T. Ito, A. Raddenzati, A. Shams, and S. Hamaguchi, Jpn. J. Appl. Phys.49, 100209 (3pp) (2010).
"Plasma-surface Interactions in Material Processing," S. Hamaguchi, J. Phys.: Conf. Series257(1), 012007 (11pp) (2010).
"Novel catalysts: indium implanted SiO2 thin films," S. Yoshimura, K. Hine, M. Kiuchi, Y. Nishimoto, M. Yasuda, A. Baba, and S. Hamaguchi, Appl. Surf. Sci.257(1) 192-196 (2010).
"Protein pattering by atmospheric-pressure plasmas," A. Ando, A. Sayed, T. Asano, R. Tero, K. Kitano, T. Urisu, and S. Hamaguchi, J. Phys. :Conf. Series227(1) 012016 (5pp) (2010).
"Effects of Hydrogen Incorporation in the Formation of Hydrogenated Diamond-like Carbon Films," Y. Murakami, K. Hosaka, and S. Hamaguchi, J. Phys. :Conf. Series232(1) 012007 (6pp) (2010).
"Evaluation of Si etching yields by Cl+, Br+, and HBr+ ion irradiation," T. Ito, K. Karahashi, S.-Y. Kang, and S. Hamaguchi, J. Phys. :Conf. Series232(1) 012021 (5pp) (2010).
"Particle-in-Cell Simulations of High-Pressure Hydrogen Plasmas Driven by Nano-second Pulsed High-Voltages," C. -W. Lo and S. Hamaguchi, J. Phys. :Conf. Series232(1) 012022 (5pp) (2010).
"Effect of light irradiation from inductively coupled Ar plasma on etching yields of SiO2 film by CF3 ion beam injections," S. Yoshimura, Y. Tsukazaki, K. Ikuse, M. Kiuchi, and S. Hamaguchi, J. Phys.: Conference Series232(1) 012020 (4pp) (2010).
"Electron density measurement for plasmas by Terahertz time-domain spectroscopy," A. Ando, H. Kitahara, T. Kurose, K. Kitano, K. Takano, M. Tani, M. Hangyo, and S. Hamaguchi, J. Phys. :Conf. Series227(1) 012016 (4pp) (2010).
"Electric field measurements at near-atmospheric pressure by coherent Raman scattering of laser beams," T. Ito, K. Kobayashi, S. Mueller, U. Czarnetzki, and S. Hamaguchi, J. Phys. :Conf. Series227(1) 012018 (2010).
"Electric field measurements in near-atmospheric pressure nitrogen and air based on a four-wave mixing scheme," S. Mueller, T. Ito, K. Kobayashi, D. Luggenhölscher, U. Czarnetzki, and S. Hamaguchi, J. Phys.: Conf. Series227(1) 012040 (4pp) (2010).
"Molecular dynamics simulation of the formation of sp3 hybridized bonds in hydrogenated diamond-like carbon deposition processes," Y. Murakami, S. Horiguchi, and S. Hamaguchi, Phys. Rev. E81(4) 041602 (9pp) (2010).
"Effects of pH on Bacterial Inactivation in Aqueous Solutions due to Low-Temperature Atmospheric Pressure Plasma Application," S. Ikawa, K. Kitano, and S. Hamaguchi, Plasma Process. Polym.7(1) 33-42 (2010).
"Structure of laboratory ball lightning," T. Ito, T. Tamura, M. A. Cappelli, and S. Hamaguchi, Phys. Rev. E80(6) 067401 (4pp) (2010).
"Rapid formation of electric field profiles in repetitively pulsed high-voltage high-pressure nanosecond discharges," T. Ito, K. Kobayashi, U. Czarnetzki and S. Hamaguchi, J. Phys. D: Appl. Phys.43(6) 062001 (5pp) (2010).
▼ Year 2009
"Effect of Ultraviolet Light Irradiation on Etching Process of Poly(methyl methacrylate) by Ion Beam Injections," S. Yoshimura, K. Ikuse, Y. Tsukazaki, M. Kiuchi, and S. Hamaguchi, J. Phys. :Conf. Series191 012030 (5pp) (2009).
"Sputtering yields of Au by low-energy noble gas ion bombardment," K. Ikuse, S. Yoshimura, K. Hine, M. Kiuchi, and S. Hamaguchi, J. Phys. D: Appl. Phys.42 135203 (7pp) (2009).
"Electric field measurement in repetitively pulsed nanosecond discharges in a high pressure hydrogen environment," Tsuyohito Ito, Kazunobu Kobayashi, Uwe Czarnetzki, and Satoshi Hamaguchi, in Proceedings of the 19th International Symposium on Plasma Chemistry, (ed. by A. von Keudell, J. Winter, M. Böke, V. Schlz-von der Gathen, July 26-31, 2009, Bochum, Germany) O4.02 (4pp) (2009).
"Atomic-Scale Numerical Simulations of Structural Properties in Carbon-Based Thin Film Deposition Processes," Yasuo Murakami, Seishi Horiguchi, and Satoshi Hamaguchi, in Proceedings of the 19th International Symposium on Plasma Chemistry, (ed. by A. von Keudell, J. Winter, M. Böke, V. Schlz-von der Gathen, July 26-31, 2009, Bochum, Germany) O7.05 (3pp) (2009).
"Electric field measurements near-atmospheric pressure nitrogen and air environments based on a four-wave mixing scheme," S. Mueller, T. Ito, K. Kobayashi, D. Luggenhölscher, U. Czarnetzki, and S. Hamaguchi, in Proceedings of the 19th International Symposium on Plasma Chemistry, (ed. by A. von Keudell, J. Winter, M. Böke, V. Schlz-von der Gathen, July 26-31, 2009, Bochum, Germany) P2.4.06 (1p) (2009).
"Estimation of Electron Densities of Plasmas by Terahertz Time-Domain Spectroscopy," H. Kitahara, A. Ando, T. Kurose, K. Kitano, K. Takano, M. Tani, M. Hangyo, and S. Hamaguchi, in Proceedings of the 34th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz 2009, 20-25 September 2009, Busan, Korea) W5E61(2pp) (2009).
"Nonequilibrium Atmospheric Plasma Jets Assisted Stabilization of Drug Delivery Carriers: Preparation and Characterization of Biodegradable Polymeric Nano-Micelles with Enhanced Stability," S. Sumitani, H. Murotani, M. Oishi, K. Kitano, S. Hamaguchi, and Y. Nagasaki, J. Photopolym. Sci. Technol.22(4) 467-471 (2009).
"Creation of Biointerface by Atmospheric Plasma Treatment of Plasma Sensitive Polymeric Materials," Swapan Kumar Saha, J. Nakanishi, K. Kitano, S. Hamaguchi, and Y. Nagasaki, J. Photopolym. Sci. Technol.22(4) 481-484 (2009).
"Preparation of Stable Water-Dispersible PEGylated Gold Nanoparticles Assisted by Nonequilibrium Atmospheric-Pressure Plasma Jets," H. Furusho, K. Kitano, S. Hamaguchi, and Y. Nagasaki, Chem. Mater.21(15) 3526-3535 (2009).
"Electric field measurement in an atmospheric or higher pressure gas by coherent Raman scattering of nitrogen," T. Ito, K. Kobayashi, S. Mueller, D. Luggenhölscher, U. Czarnetzki, and S. Hamaguchi, J. Phys. D: Appl. Phys.42(9) 092003 (4pp) (2009).
"Three-Dimensional Tomographic Imaging in Terahertz Region," H. Kitahara, M. Tani, and M. Hangyo, Jpn. J. Appl. Phys.49(2) 020207 (2010).
"High-repetition-rate optical delay line using a micromirror array and galvanometer mirror for a terahertz system," H. Kitahara, M. Tani, and M. Hangyo, Rev. Sci. Instruments80(7) 076104 (2009).
"Observation of radial displacement of translated field reversed configuration plasma using computer tomography at two different cross sections," S. Yoshimura and S. Okada, J. Plasma and Fusion Research SERIES8 645-648 (2009).
"Two-Dimensional Electro-Optic Sampling of THz Radiation Using High-Speed Complementary Metal-Oxide Semiconductor Camera Combined with Arrayed Polarizer," H. Kitahara, M. Tani, and M. Hangyo, Appl. Phys. Lett.94(10) 091119 (4pp) (2009).
▼ Year 2008
"Design of Biointerface by Nonequilibrium Atmospheric Plasma Jets -Approach from Plasma Susceptible Polymers," Y. Nagasaki, M. Umeyama, M. Iijima, K. Kitano, and S. Hamaguchi, J. Photopolym. Sci. Technol.21 267-270 (2008).
"High-Beta Steady-State FRC Plasma Sustained by Rotating Magnetic Field with Spatial High-Harmonic Components," M. Inomoto, K. Yambe, K. Kitano, S. Okada, and T. Asai, Journal of Fusion Energy DOI10.1007/s10894-008-9168-8 (2008).
"Generation of Dust Seeds by Sputtering of Carbon-based Plasma Facing Materials under Low-energy H/D/T Ion Bombardment," Masashi Yamashiro and Satoshi Hamaguchi, Proceedings of the 22nd IAEA Fusion Energy Conference (13-18 Oct., 2008, Geneva, Switzerland) Online Preprint # TH/P4-7-1-8 (2008).
"Electromagnetic Self-Organization and Transport Barrier Relaxations in Fusion Plasmas," G. Fuhr, S. Benkadda, P. Beyer, M. Leconte, X. Garbet, I. Sandberg, H. Isliker, D. Reiser, I. Caldas, Z.O. Guimaraes-Filho, and S. Hamaguchi, Proceedings of the 22nd IAEA Fusion Energy Conference (13-18 Oct., 2008, Geneva, Switzerland) Online Preprint # TH/P8-9-1-8 (2008).
"Experimental evaluation of MgO sputtering yields by monochromatic Kr/Xe ion beams," K. Hine, S. Yoshimura, K. Ikuse, M. Kiuchi, J. Hashimoto, M. Terauchi, M. Nishitani, and S. Hamaguchi, Thin Solid Films517(2) 835-840 (2008).
"High Speed Images of Drift Waves and Turbulence in Magnetized Microplasmas," T. Ito and M. A. Cappelli, IEEE Trans. Plasma Sci.36 1228-1229 (2008).
"Magnetized Microdischarge Plasma Generation at Low Pressure," T. Ito, K. Kobayashi, S. Hamaguchi, and M. A. Cappelli, Thin Solid Films516 6668-6672 (2008).
"Measurement of sticking probability and sputtering yield of Au by low-energy mass selected ion beams with a quartz crystal microbalance," K. Ikuse, S. Yoshimura, M. Kiuchi, K. Hine, and S. Hamaguchi, J. Phys. :Conf. Series106 012016-1-3 (2008).
"Measurement of Au sputtering yields by Ar and He ions with a low-energy mass selected ion beam system," K. Hine, S. Yoshimura, K. Ikuse, M. Kiuchi, and S. Hamaguchi, J. Phys. : Conf. Series106 012019-1-3 (2008).
"Magnetized microdischarge plasmas in low pressure argon and helium," K. Kobayashi, T. Ito, M. A. Cappelli, and S. Hamaguchi, J. Phys.: Conf. Series106 012020 (6pp) (2008).
"Development of NIR Bioimaging Systems," Kohei Soga, Takashi Tuji, Fumio Tashiro, Joe Chiba, Motoi Oishi, Keitaro Yoshimoto, Yukio Nagasaki, Katsuhisa Kitano, and Satoshi Hamaguchi, J. Phys. : Conf. Series106 012023-1-5 (2008).
"Soft x-ray computer tomography of double m=2 mode during off-axis sawtooth oscillation with five detector arrays on the WT-3 tokamak," S. Yoshimura, T. Maehara, and T. Maekawa, IEEE Transactions on Plasma Sci.36(4) 1268-1269 (2008).
"Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmas," M. Matsukuma and S. Hamaguchi, Thin Solid Films516(11) 3443-3448 (2008).
"Molecular dynamics simulations for nitridation of organic polymer surfaces due to hydrogen-nitrogen ion beam injections," M. Yamashiro, H. Yamada, and S. Hamaguchi, Thin Solid Films516(11) 3449-3453 (2008).
▼ Year 2007
"Behaviour of a low frequency wave in a FRC plasma," S. Okada, M. Inomoto, S. Yamamoto, T. Masumoto, S. Yoshimura, and K. Kitano, Nuclear Fusion47(7) 677-681 (2007).
"Synthesis of uniformly dispersed metal nanoparticles with dispersion stability by nonequilibrium atmospheric plasma jets," H. Furusho, D. Miyamoto, Y. Nagasaki, K. Kitano, and S. Hamaguchi, J. Photopolym. Sci. Technol.20(2) 229-233 (2007).
"Field-reversed configuration maintained by rotating magnetic field with high spatial harmonics," M. Inomoto, K. Kitano, and S. Okada, Phys. Rev. Lett.99 175003 (4pp) (2007).
"Propagation and damping characteristics of low-frequency waves in field-reversed configuration plasmas," M. Inomoto, S. Yamamoto, N. Iwasawa, K. Kitano, and S. Okada, Phys. Plasmas14 102513 (4pp) (2007).
"Observation of tilting activities in translated field reversed configuration plasma using computer tomography at two different cross sections," S. Yoshimura, S. Sugimoto, and S. Okada, Phys. Plasmas14(11) 112514 (4pp) (2007).
"Measurement of magnesium oxide sputtering yields by He and Ar ions with a low-energy mass-selected ion beam system," K. Hine, S. Yoshimura, K. Ikuse, M. Kiuchi, J. Hashimoto, M. Terauchi, M. Nishitani, and S. Hamaguchi, Jpn. J. Appl. Phys.46(46) L1132-L1134 (2007).
"Modelling of plasma surface interaction," S. Hamaguchi, M. Yamashiro, M. Matsukuma, and H. Yamada, J. Phys. :Conf. Series86(1) 023016-1-7 (2007).
"Experimental Characterization of a Micro Hall Thruster," T. Ito, N. Gascon, W. S. Crawford, and M. A. Cappelli, J. Propul. Power23 1068-1074 (2007).
"Control of atomic layer degradation on Si substrate," Y. Nakamura, T. Tatsumi, S. Kobayashi, K. Kugimiya, T. Harano, A. Ando, T. Kawase, S. Hamaguchi, and S. Iseda, J. Vac. Sci. Tech. A25(4) 1062-1067 (2007).
"High-m multiple tearing modes in tokamaks: MHD turbulence generation, interaction with the internal kink and sheared flows," A. Bierwage, S. Benkadda, M. Wakatani, S. Hamaguchi, and Q. Yu, Proc. the 21st IAEA Fusion Energy Conference (IAEA-XSP-25/CD, 2007), CD-ROM file TH/P3-3.
"Behaviour of a low frequency wave in a FRC plasma," S. Okada, M. Inomoto, T. Masumoto, S. Yoshimura, and K. Kitano, Proc. the 21st IAEA Fusion Energy Conference (IAEA-XSP-25/CD, 2007) Fusion Energy 2006, (2007) CD-ROM file EX/P6-15.
"Investigation of translation process of field reversed configuration plasma using computer tomography data at two different cross-sections," S. Yoshimura, S. Sugimoto, and S. Okada, Transactions of Fusion Science and Technology51(2T) 376-378 (2007).
"Recent FRC plasma studies," S. Okada, T. Masumoto, S. Yamamoto, M. Inomoto, K. Kitano, and S. Yoshimura, Transactions of Fusion Science and Technology51(2T) 193-196 (2007).
"Atomic-level simulation of non-equilibrium surface chemical reactions under plasma-wall interaction," S. Hamaguchi, M. Yamashiro, and H. Yamada, Comp. Phys. Comm.177(1,2) 108-109 (2007).
"Incident energy dependence of crystalline structure on ion beam deposited Au thin films," T. Takizawa, T. Maeda, M. Kiuchi, S. Yoshimura, and S. Hamaguchi, Phil. Mag.87(10) 1487-1495 (2007).
"Temporal evolution of ion fragment production from dimethylsilane by a hot tungsten wire and compounds deposited on the tungsten surface," S. Yoshimura, A. Toh, M. Kiuchi, and S. Hamaguchi, Jpn. J. Appl. Phys.46(4A) 1707-1709 (2007).
"On the Production of Energetic Neutrals in the Cathode Sheath of Direct-Current Discharges," T. Ito and M. A. Cappelli, Appl. Phys. Lett.90(10) 101503 (3pp) (2007).
"Molecular dynamics simulations of organic polymer dry etching at high substrate temperatures," M. Yamashiro, H. Yamada, and S. Hamaguchi, Jpn. J. Appl. Phys.46(4A) 1692-1699 (2007).
"Molecular dynamics simulation analyses on injection angle dependence of SiO2 sputtering yields by fluorocarbon beams," T. Kawase and S. Hamaguchi, Thin Solid Films515(12) 4883-4886 (2007).
"Time evolution of electrode voltage distribution in large-area capacitively coupled plasmas," M. Matsukuma and S. Hamaguchi, Thin Solid Films515(12) 5188-5192 (2007).
"MD simulations of amorphous SiO2 thin film formation in reactive sputtering deposition processes," M. Taguchi and S. Hamaguchi, Thin Solid Films515(12) 4879-4882 (2007).
"Dynamics of resistive double tearing modes with broad linear spectra," A. Bierwage, S. Benkadda, S. Hamaguchi, and M. Wakatani, Phys. Plasmas14(2) 022107 (10pp) (2007).
"Molecular dynamics simulation study on substrate temperature dependence of sputtering yields for an organic polymer under ion bombardment," M. Yamashiro, H. Yamada, and S. Hamaguchi, J. Appl. Phys.101(4) 046108 (3pp) (2007).
▼ Year 2006
"Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes," M. Taguchi and S. Hamaguchi, J. Appl. Phys.100(12) 123305 (9pp) (2006).
"Temporal evolution of ion fragment production from methylsilane by a hot tungsten wire," S. Yoshimura, A. Toh, T. Toyoshima, M. Kiuchi, and S. Hamaguchi, J. Appl. Phys.100(9) 096107 (3pp) (2006).
"Radio-Frequency (RF)-driven atmospheric-pressure plasmas in contact with liquid," K. Kitano, H. Aoki, and S. Hamaguchi, Jpn. J. Appl. Phys.45(10B) 8294-8297 (2006).
"Fragment Ions of Dimethylsilane Produced by Hot Tungsten Wires," S. Yoshimura, A. Toh, S. Sugimoto, M. Kiuchi, and S. Hamaguchi, Jpn. J. Appl. Phys.45(10B) 8204-8207(2006).
"Numerical analysis of incident angle effects in reactive sputtering deposition of amorphous SiO2," M. Taguchi and S. Hamaguchi, Jpn. J. Appl. Phys.45(10B) 8163-8167 (2006).
"Topography evolution of dielectric thin films on grating surfaces in Oblique Deposition by Multiple Sources (ODMS)," M. Taguchi, T. Kunisada, S. Kusaka, and S. Hamaguchi, IEEE Trans. Plasma Sci.34(4) 1084-1093 (2006).
"Nonlinear evolution of the m = 1 internal kink mode in the presence of magnetohydrodynamic turbulence," A. Bierwage, S. Benkadda, S. Hamaguchi, and M. Wakatani, Phys. Plasmas13(3) 032506 (13pp) (2006).
"Fragment ions of methylsilane produced by hot tungsten wires," S. Yoshimura, A. Toh, T. Maeda, S. Sugimoto, M. Kiuchi, and S. Hamaguchi, Jpn. J. Appl. Phys.45(3A) 1813-1815 (2006).
▼ Year 2005
"Fast growing double tearing modes in a tokamak plasma," A. Bierwage, S. Benkadda, S. Hamaguchi, and M. Wakatani, Phys. Plasmas12(8) 082504 (12pp) (2005).
"Visualization of Interactions between Organic Polymer Surfaces and Ion beams obtained from Molecular Dynamics Simulations," H. Yamada and S. Hamaguchi, IEEE Trans. Plasma Sci.33(2) 246-247 (2005).
"Soft x-ray computer tomography of sawtooth collapse associated with m=2 and m=3 modes with five detector arrays on the WT-3 tokamak," S. Yoshimura, M. Sukegawa, T. Maekawa, and Y. Terumichi, IEEE Trans. Plasma Sci.33(2) 444-445 (2005).
"Nusselt number scaling in tokamak plasma turbulence," K. Takeda, S. Benkadda, S. Hamaguchi, and M. Wakatani, Phys. Plasmas12(4) 052309 (8pp) (2005).
"Numerical analyses of surface interactions between radical beams and organic polymer surfaces," H. Yamada and S. Hamaguchi, Plasma Phys. Control. Fusion47 A11-A18 (2005).
"On Interatomic Potential Functions for Molecular Dynamics (MD) Simulations of Plasma-Wall Interactions," S. Hamaguchi, H. Ohta, and H. Yamada, J. Plasma and Fusion Research, SERIES 6, 80-83 (2005).
"Plasma Beam Irradiation into Organic Polymer Surfaces," H. Yamada and S. Hamaguchi, J. Plasma and Fusion Research, SERIES 6, 402-405 (2005).
"Effects of Van der Waals interactions on SiO2 etching by CFx plasmas," H. Ohta and S. Hamaguchi, J. Plasma and Fusion Research, SERIES 6, 399-401 (2005).
"Study on Transport Regimes of Ion Temperature Gradient Driven Turbulence," K. Takeda, S. Benkadda, S. Hamaguchi, and M. Wakatani, J. Plasma and Fusion Research, SERIES 6, 570-572 (2005).
"Nonlinear evolution of q=1 triple tearing modes in a tokamak plasma," A. Bierwage, S. Hamaguchi, M. Wakatani, S. Benkadda, and X. Leoncini, Phy. Rev. Lett.94 065001 (4pp) (2005).